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High-Order Surface Relaxation vs. the Ehrlich-Schwoebel Effect
in Thin-film Growth
Bo Li
Department of Mathematics
UCSD
Abstract
The surface of an epitaxially growing thin film often exhibits a
mound-like structure with its characteristic lateral size increasing
in time. In this talk, we consider two competing mechanisms for
such a coarsening process: (1) surface relaxation described by
high-order gradients of the surface profile; and (2) the Ehrlich-Schwoebel
(ES) effect which is the upper-lower terrace asymmetry in the adatom
attachment and detachment to and from atomic steps. We present a
theory based on a class of continuum models that are mathematically
gradient-flows of some effective free-energy functionals describing
these mechanisms. This theory consists of two parts: (1) variational
properties of the energies, such as ``ground states'' and their
large-system-size asymptotics, showing the unboundedness of surface
slope and revealing the relation between some of the models;
(2) rigorous bounds for the scaling law of the roughness, the rate of
increase of surface slope, and the rate of energy dissipation, all of
which characterize the coarsening process. Predictions on scaling
laws made by our theory agree well with experiments.
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